Technology: Chemical Vapor Deposition (CVD)

ALTUS Product Family

Atomic Layer Deposition (ALD) Chemical Vapor Deposition (CVD)

Combining CVD and ALD technologies, these market-leading systems deposit highly conformal metal films for advanced tungsten metallization applications.

Advanced Memory, Interconnect, Packaging, Transistor

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Reliant Deposition Products

Chemical Vapor Deposition (CVD) High-Density Plasma Chemical Vapor Deposition (HDP-CVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Reliant Systems

Lam’s refurbished and newly built Reliant products offer reliable, production-proven solutions at low cost of ownership for dielectric film applications.

Advanced Memory, Analog & Mixed Signal, Discrete & Power Devices, Interconnect, Optoelectronics & Photonics, Packaging, Patterning, Sensors & Transducers, Transistor

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