Solution: Interconnect
ALTUS Product Family
Atomic Layer Deposition (ALD) Chemical Vapor Deposition (CVD)
Combining CVD and ALD technologies, these market-leading systems deposit highly conformal metal films for advanced tungsten metallization applications.
Coronus Product Family
Plasma Bevel Clean
These bevel clean systems remove unwanted materials from the wafer’s edge while protecting the active die area to enhance die yield.
DV-Prime & Da Vinci Product Families
Spin Wet Clean
These products provide the process flexibility needed with high productivity to address multiple wafer cleaning steps throughout manufacturing.
EOS Product Family
Spin Wet Clean
Lam’s advanced wet clean products deliver exceptionally low on-wafer defectivity at high throughput for progressively demanding applications.
Flex Product Family
Atomic Layer Etch (ALE) Reactive Ion Etch
Lam’s dielectric etch systems offer application-focused capabilities for creating a wide range of challenging structures in advanced devices.
GAMMA Product Family
Dry Strip
These products provide the process flexibility needed to address a wide range of critical photoresist strip applications.
Kiyo Product Family
Atomic Layer Etch (ALE) Reactive Ion Etch
Lam’s market-leading conductor etch products deliver the high-performance precision and control at high productivity needed for critical device features.
SABRE Product Family
Electrochemical Deposition (ECD)
This product family offers precision metal plating for copper damascene manufacturing on the industry’s productivity-leading ECD platform.
SOLA Product Family
Ultraviolet Thermal Processing (UVTP)
This product family offers specialized post-deposition film treatments to improve physical characteristics for advanced film applications.
SPEED Product Family
High-Density Plasma Chemical Vapor Deposition (HDP-CVD)
These dielectric deposition products provide complete gapfill of high aspect ratio spaces with industry-leading throughput and reliability.