Solution: Interconnect
Syndion Product Family
DRIE Reactive Ion Etch
For deep etch applications, this product family provides the exceptional across-wafer uniformity control needed for critical high aspect ratio features.
VECTOR Product Family
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Lam’s PECVD product family provides precise dielectric film deposition at high productivity for a wide range of device applications.
Versys Metal Product Family
Reactive Ion Etch
These metal etch products provide excellent process control at high-productivity for electrical connection and metal hardmask applications.